The spin coater is also called spin coating machine. It is mainly used for photoresist coating on wafers or thin film preparation in sol-gel experiments. The basic principle of the glue spreader is to drip various glues on the substrate rotating at a high speed and use centrifugal force to make the glue dripped on the substrate evenly coated on the substrate. The thickness of the film is related to the viscosity of the glue, the viscosity coefficient between the glue and the substrate, the number of revolutions, and the spin coating time. In general, when the rotation speed is above 2000rpm, most of the colloids can be evenly distributed. The stability and repeatability of the spindle speed are the key to determining the uniformity and consistency of the film thickness.
Small Programmable Compact Vacuum EZ4 PP Spin Coater with oil-less vacuum pump and 3 chucks MG-EZ4-S-PP
1.Small appearance, suitable for glove box operation
2. Corrosion resistant transparent cover, constant torque positioning chain
3. Integrated mold opening cavity, easy to disassemble and clean, easy to replace
4 .LCD text display, color mask key, easy to use
5. The speed of addition and reduction is controllable and adjustable, and multi-step program operation control can be set
6. Brushless DC motor, maximum recommended spin coating size :4 inches round substrate
7. Aluminum alloy shell (EZ4-S), corrosion resistant PP shell optional (EZ4-S-PP)
Product Parameter | |
Range of speed | 100-9999rpm |
Speed resolution | 1rpm |
Adjustable range of acceleration | 100-9999rpm/s |
Maximum single step length | 3000S |
temporal resolution | 1s |
Wide voltage application | AC100-230V input, English and Chinese optional |
Single step or multi-step operation is optional. Up to 5 groups of 5-step programs can be set | |
Standard with 10mm, 25mm, 2 - inch vacuum tray | |
Spin coater is a laboratory equipment widely used for coating uniform thin films, and is commonly used in the fields of materials science, electronics, optics and chemistry. Its main uses and working principles are as follows:
Use
Photoresist coating: In microelectronics and semiconductor manufacturing, spin coater is often used to coat photoresist on substrates for subsequent photolithography processes.
Thin film preparation: Used to prepare uniform organic or inorganic thin films, such as the active layer in perovskite solar cells, the light-emitting layer in OLEDs, etc.
Protective coating: Provide a protective coating for samples to prevent oxidation, corrosion, etc.
Biomedical applications: Prepare functional films for biosensors or drug delivery.
Principle
The working principle of spin coater is based on centrifugal force, and the specific steps are as follows:
Coating solution: Drop the solution to be coated on the center of the substrate.
Rotation: After the equipment is started, the substrate starts to rotate at high speed. The rotation speed and time can be adjusted as needed.
Diffusion and film formation: Due to the action of centrifugal force, the solution diffuses outward from the center of the substrate to form a thin film. At the same time, the volatilization of the solution causes the film to gradually dry and solidify.
Uniformity: By adjusting the spin speed and time, the thickness and uniformity of the film can be controlled. Generally, the higher the spin speed, the thinner the film.
Specific parameters
Spin speed: Generally ranges from a few hundred revolutions per minute (RPM) to a few thousand RPM.
Time: Varies from a few seconds to a few minutes, depending on the properties of the solution and the desired film thickness.
Notes
Solution properties: The viscosity, volatility, and surface tension of the solution will affect the coating effect.
Environmental conditions: Temperature and humidity will also affect the formation and quality of the film.
Spin coater is a key equipment for preparing high-quality, uniform films, and is widely used in scientific research and industrial production.
